Vacuum coating units: To deposit thin film samples at desired substrate
temperature and pressure 10-5 torr. The coating units are assigned
exclusively for depositing different metal chalcogenides.
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Vacuum Coating Unit for the deposition
of Selenide thin films
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Vacuum Coating Unit for the deposition
of Telluride thin films
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Vacuum Coating Unit for the deposition
of Sulphide thin films
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Vacuum Coating Unit for the deposition
of metal electrodes.
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Two
Probe apparatus: It is used to measure the DC Conductivity. Measurements are taken under
vacuum of the order of 10-2 torr.
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Tolansky’s Multiple beam Interferometric method: This method can be used to measure the thickness
of a thin film to an accuracy of ±20A0.
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Hot
air oven: Used for annealing
purposes. Temperature can be
controlled from ambient temperature
to 2500C
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